A New Type Of Thermal Micro/Nano Printing System And Its Application

With the development of nanotechnology, the demand for processing microstructures is great needed. Nowadays there are several methods dealing with it. Among them, LIGA technology under Synchrotron Radiation Light source is an effective way to get high aspect ratio microstructure but with low precision (large than 1?m) and high cost-effectiveness. Electron Beam Lithography (EBL) or Focused-Ion-Beam (FIB) is another one which takes over the disadvantages of LIGA by increasing the precision (less than hundred nano-meters even tens nano-meters) using electron or ion instead of light, but still with high cost as well as LIGA. A relatively cheaper method with inexpensive machine and simple process is Ultra-Violetlithography, whereas its precision is low approximately micrometre or hundred nano-meters. Nevertheless, all of the methods mentioned above can't yield large area microstructure. So, it is necessary to develop new methods which can convenient manufacture micro/nano structures with large area, high precision and low cost.Here we presented a micro/nano thermal printing method to address these issues. The system consist of four subsystems e.g., mechanical system, control system, communication system and software system.In condition, a performance testing was carried out on PMMA by printing optic grating. The testing draws a conclusion that the micro/nano thermal printing system can efficiently print high precision microstructure under sub-wavelength.Last, some experiments were carried out on the metallic glasses by thin metallic glasses, block metallic glasses and melt spinning metallic glasses. By printing microstructure, the character of metallic glasses was explored...