Polymer Flow And Filling Behavior For Electroosmosis-driven Nanoimprint Lithography

Large scale HD flat panel display(with the moth eye structure of the television screen),efficient solar panels,high performance glass(anti reflection and self-cleaning glass),LED(graphical micro nano patterned sapphire substrate NPSS,photonic crystal LED),wafer level micro nano optical devices(wafer level camera)and other fields in order to improve and improve the quality and performance of products,the industry has a very great demand for large area graphic technology of micro nano.These are the common characteristics is needed in large size non smooth(large bending and warping,the thickness of large scale change)rigid(Yi Sui)substrate(hard substrate or substrate)manufactured with high efficiency and low cost of large and complicated three-dimensional micro nano structure.However,the existing traditional micro nano manufacturing technology both from a technical level(a large area of non smooth rigid fragile substrate micro nano patterned substrate,large size rigid and brittle micro nano patterned),or in the actual large-scale production(high production cost,low production efficiency)are difficult to meet the actual requirements of industrial mass production the bottleneck of these high performance products are widely used.The electroosmotic nanoimprint is a new type of nano imprint technology,this technology will be introduced to the DC voltage of nano imprint device,liquid polymer in electric field(volume force)of the mold cavity of the micro nano structure under the action of active fast consistency filling,to avoid the introduction of nano grade traditional MPa stamping process stamping force,making it in large area nanoimprint and high aspect ratio micro nano structure manufacturing,especially in the non smooth(warping and surface)has very prominent advantages and potential of substrate and fragile substrate nano patterning.And it has reached the requirement of large scale industrial grade(low production cost and high production efficiency).However,electroosmotic nanoimprint is different from the existing "pressure driven" and "nano imprint electro capillary force driving" nano imprint lithography,nanoimprint lithography has filled polymer rheological theory and the results are no longer applicable.Therefore,it is urgent to study the electroosmotic nanoimprint filling mechanism based on polymer rheology.However,electroosmotic nanoimprint is different from the existing "pressuredriven" and "nano imprint electro capillary force driving" nano imprint lithography,nanoimprint lithography has filled polymer rheological theory and the results are no longer applicable.Therefore,it is urgent to study the electroosmotic nanoimprint filling mechanism based on polymer rheology.This paper carried out the research on electroosmotic nano imprint polymer rheological filling mechanism,influence factors and rules.Based on the principle of electroosmosis micro fluid drive,electroosmotic driving force,nano imprint volume filling speed and filling time of the model,analyzed the stress characteristics and interface dynamic filling liquid polymer nano imprint lithography process,gives the electric force(volume force),model theory,surface tension,internal friction and adhesion hysteresis force.Software simulation of multi physics field by COMSOL Multiphysics,revealed in the dynamic process of liquid polymer filling mold cavity,influence factors of process parameters,die geometry,material properties for polymer filled nano imprint rheological and Zeta potential,voltage and polymer viscosity of polymer filling speed.This study lays a theoretical foundation for electroosmotic nanoimprint technology,and provide important theoretical support and direction for improvement and optimization of electroosmotic equipment development and properties of nano imprint lithography process.The feasibility of process driven nano imprint technique for verification of electroosmosis,this paper designs a set of experimental platform and experimental platform: the transparent ITO conductive film and through the parent template has the characteristics of structure of complex soft mold obtained by PDMS soft mold,ITO conductive glass as substrate,nanoimprint lithography through photoresist deployment can be cured under UV light,by comparing under different voltages,different photoresist filling height in the mold cavity,by comparing with the simulation results finds similar results to prove the feasibility of the new process.