Lapping Process Of Zirconia Ceramic Backplane By Fixed Abrasive

Zirconia ceramic materials have been widely used in aerospace industry,energy materials,refractory material,metallurgy,automobile,machinery,instrumentation,electronic communications,bio functional materials and other fields because of its excellent physical and chemical properties.Zirconia ceramics are typical hard to machine materials because of their high hardness and brittleness.In recent years,fixed-abrasive lapping technology has been become a research hotspot for its high processing efficiency,low environmental pollution,high abrasive utilization,good surface quality and so on.In this paper,fixed-abrasive lapping technology was adopted to lap of the zirconia ceramic panel mater ials.The effects of single crystal diamond and agglomorated diamond abrasive on the processing of zirconia ceramic panel by FAP were studied,and the process parameters were optimized to enhance the machining efficiency and surface quality of zirconia ceramics.The research work of this paper is as follows:(1)The effects of particle size of single crystal diamond,particle size and concentration of SiC slurry on the processing of zirconia ceramic panel by FAP were investigated.The results show that with the increase of diamond particle s ize and S iC particle s ize,the material removal rate becomes larger,the surface quality becomes worse.With the increase of the concentration of SiC slurry,the material removal rate becomes larger,the surface roughness is basically unchanged.When the particle size of SiC slurry is W5 and the concentration is 3%,there is no obvious defect on the surface of the panel,the material removal rate reaches 427nm/min.(2)The effect of primary particle size of agglomorated diamond abrasive on the processing of zirconia ceramic panel by FAP was investigated.The results show that with the increase of the primary particle size of agglomorated diamond abrasive,the surface roughness becomes larger and the uniformity of material removal becomes worse.When the SiC slurry wasn't added into the lapping fluid,the self-sharpening property of agglomorated diamond abrasive with the primary particle size of W3 was best,the material removal rate was 70nm/min,the surface roughness Ra was 28.4nm.When the SiC slurry was added into the lapping fluid,the self-sharpening property of agglomorated diamond abrasive with the primary particle size of W5 was best,the material removal rate was as high as 824nm/min,and the surface roughness Ra was 37.2nm.(3)The process parameters of SiC slurry assisted agglomorated diamond abrasive lapping zirconia ceramic panel were optimized.The effects of lapping pressure,FAP speed,the flow rate of lapping liquid and the concentration of TEA on the removal rate and surface quality of zirconia ceramic panel were investigated by orthogonal experiment method.And the optimum process parameters were obtained by combining optimization: lapping pressure 21 kPa,FAP speed 120r/min,the flow rate of lapping liquid 80ml/min,the concentration of TEA 5%.The optimized material removal rate was 1325nm/min and the surface roughness Ra was 16.5nm.