Study On The Preparation Of The Inverse Opal Photonic Crystals On Textiles

In the traditional preparation of inverse opal photonic crystal structures,hard materials are used as substrates and high-temperature calcination,dissolving or chemical etching are applied to remove.opal template.However,these methods are not suitable to the fabrication of inverse opal photonic crystals on the surface of flexible textile substrates.In our study,with textiles as substrates,the inverse opal structure of photonic crystals were fabricated by means of UV-irradiation to remove opal template,which might provide a new way to the construction of inverse opal photonic crystal on textile substrates.The major work could be summarized of the three aspects:1.Monodisperse PMMA microspheres were prepared by soap-free emulsion polymerization and the influences of MMA monomer concentrations,initiator concentrations,stirring speeds and temperatures on the diameter and monodispersity of PMMA microspheres were studied;2.PMMA photonic crystals with opal-structure was made by vertical deposition on polyester substrates,and the self-assembly factors?like assembly temperature,relative humidity and concentrations of microspheres?on the effects of PMMA photonic crystal structures were investigated;3.With PMMA opal crystals as template,SiO₂ nanoparticles and the precursor solution of TiO₂ as filling materials,SiO₂ and TiO₂ inverse opal photonic crystals were fabricated on textiles by means of UV-irradiation to remove PMMA template.The influences of filling process and UV irradiation process on the construction of inverse opal structure were studied.The main results were as follows:1.The monodispersed PMMA microspheres in the diameter of 250-550 nm could prepared by soap-free emulsion polymerization.Within certain limits,to increase monomer concentrations could increase the particle size,to increase stirring speeds and temperature could reduce the particle size,and to increase initiator concentrations could increase the particle size at first then reduce it;2.In the vertical deposition self-assembly process,the assembly temperature of 40?,the relative humidity of 60%and the colloidal microsphere concentration of 2 wt%are applicable to FCC PMMA optics crystal structure on the polyester fabrics of high quality;3.The uniform filling in the opal template was key to the fabrication of the inverse opal photonic crystals.Both the more or less filling were negative to the subsequent UV irradiation;4.The UV irradiation to remove opal templates in the fabrication of inverse opal photonic crystals was regarded to be applicable to different UV light sources.The PMMA opal template could be removed by the extenion of the ultraviolet irradiation time.If the UV irradiation distance became larger,the irradiation time should be extended appropriately.