Effect Of Deposition Parameters On Micro-structure And Properties Of TiN Thin Films In Micro-arc Discharge Region

According to the characteristics of large current and high voltage in the range of micro-arc discharge,the ion bombardment intensity and the bombardment density of cathode target surface can be greatly increased.In this paper,the double pulse electric field environment is used.By regulating the average target current,the volt-ampere characteristic of gas discharge is in the region of glow discharge and micro-arc discharge with anti-ohmic characteristic.At the same time,the TiN film is prepared at different nitrogen flow rate in the region of micro-arc discharge,and the microstructure of the film is analyzed.The mechanical and corrosion resistance of TiN thin films prepared in different gas discharge regions were examined and analyzed.The effects of nitrogen flow rate in micro-arc discharge region on the structure and properties of TiN thin films were studied.Conclusion:In the condition of double pulse electric field,the volt-ampere characteristic of gas discharge was introduced from glow discharge region(average target current<2.5A)to the micro-arc discharge region(average target current>2.5A)by increasing the average target current,and a number of TiN thin films were prepared.Through the analysis of the phase and structure of the thin film,it can be seen that with the increase of the average target current,the preferred orientation of tin film changes from the crystal plane of the glow discharge region to the crystal plane of the micro-arc discharge region,and the degree of crystallization is obviously improved.The grains changed from the disordered cluster structure to the regular triangular conical structure.Hardness,bonding strength and The results of corrosion resistance study show that the variation of glow discharge region is consistent with that of micro-arc discharge region,and both of them are increasing with the increase of average target current,and when the average target current increases to the maximum value 3A,The film has the maximum hardness(27.1 GPA)and the H/E value(0.082),and the bonding strength and corrosion resistance of the film are improved obviously.With the increase of average target current,the increasing amplitude of micro-arc discharge range is obviously larger than that of glow discharge region.When the average target current reaches the maximum value,the maximum actual deposition rate is 203.44 nm/min,and the order is better than the same parameter.Deposition rate of TiN films under pulsed electric field.The volt-ampere characteristics of the gas discharge into the micro-arc discharge range were obtained by a double-pulse electric field environment,and a number of films were prepared by regulating the nitrogen flow rate.The results show that the preferred orientation of the thin film changes from 100)to 200)with the increase of nitrogen flow rate,and the structure changes from triangular-cone to cellular cluster structure.The results of mechanical properties and corrosion resistance of the films show that when the nitrogen flow rate is the minimum value of 10sccm,the bonding strength and corrosion resistance of the films are the best,with larger microhardness of(22.3 GPA)and H/E value of(0.074).A downward trend.The deposition rate of the film decreases with the increase of the nitrogen flow rate.The actual deposition rate of the film reaches the maximum(155.12 nm/min)when the nitrogen flow rate is the minimum.