Experimental Study Of Fabricating Sub-diffraction-limit Nano-channel Based On CW-DLW

In this paper,the key technical problems concerning the Far-field Optical Super-resolution Microscopic Imaging Synthesis Analysis System have been tackled.Based on the self-built system,the study of micro-/nano-composite structure processing and fabricating technology has been investigated.The core ideology of fabricating sub-diffraction limit nano-channel with continuous-wave direct laser writing(CW-DLW)is the ultralow one-photon absorption of polymer induced by employing a focal spot with a dark core.The fabrication of nano-channel with a smaller size than the diffraction limit and a kind of nano-channel array structure is finally achieved based on this kind of the 532nm CW-DLW system,and the diameter of the minimum nanop-channel is 1/10 the wavelength of incident light.In this thesis,firstly,the key techniques about the modulation of donut-shaped beam and the coaxial coupling of two laser beam in the Far-field Optical Super-resolution Microscopic Imaging Synthesis Analysis System has been presented in detail,as well as,the building and integrating of the whole system.The absorption characteristics and mechanism of SU-8 photoresist with different exciting laser wavelength are discussed and the details of the preparation of SU-8 are described.The spatial light intensity distribution of the spot is carried out and the theory of developing a ultra-diffraction limit nano-channel based on continuous-wave direct laser writing is demonstrated.Eventually,the morphology and size of the nano-channel are characterized by SEM,and we summarize the influence of several vital factors on the size and quality of the nano-channel,such as exposure time,exposure power and developing time.Furthermore,the effects of the incident laser intensity and time parameters on the size of the nano-channel and the fabrication effects of the nano-channel array structure are analyzed and discussed.