Research On Micro-nano Patterning Based On Pen-Direct-Writing

Micro-nano manufacturing refers to the processing method of micro-scale or nano-scale functional devices,due to the small scale of processing functional devices,traditional mechanical processing can no longer meet the processing requirements,therefore,micro-nano manufacturing mainly relies on planar integrated processing technology,the technology includes three parts: thin film deposition? graphic imaging and graphic transfer,among them,graphic imaging is indispensable and also a major factor affecting micro-nano manufacturing.High-quality? high-efficiency? low-cost graphics imaging can be realized is great significance to apply micro-nano manufacturing technology in micro-nano electronic chip manufacturing and semiconductor device manufacturing.Optical lithography and model replication are the main methods of graphic imaging,which rely on the manufacture of masks and impressions,the process of manufacturing masks and impressions is complicated? costly and has a short service life,the cost of micro-nano manufacturing is greatly improved,and the micro-nano manufacturing technology is more complicated.Aiming at the problems existing in the above micro-nano manufacturing in graphic imaging,a pen-based direct-writing micro-nano pattern method was proposed,and a set of pen-based automatic direct-writing system based on force feedback was built,it enables efficient? low cost? high precision graphic imaging.Firstly,the working principle of pen-direct-writing was studied,the characteristics of pen? direct-writing material? direct-writing substrate and the effect of direct-writing process control on the pen-writing pattern performance were analyzed,the width of 30?m line was completed on the silicon substrate,the direct-writing provides a theoretical basis for the pen-directed micro-nano patterning applied to micro-nano manufacturing.Secondly,in order to improve the current situation of low automation and poor control precision of pen-type direct writing,pen-based automatic direct-writing system based on force feedback is built,the system hardware includes high-precision displacement table? high-resolution force sensor and data acquisition card etc,software control is implemented through LABVIEW programming,including data acquisitionprogram? motion control program,and drawing boards program.The stage can realize real-time force adjustment control,which can realize continuous lines and dot matrix direct writing of arbitrary patterns,and also verify its performance through experiments.It greatly improves the automation of pen-direct-writing,and provides technical support for the application of pen-direct-writing.Finally,the study used maltose as a mask material to fabricate gold electrodes and silicon wafers by physical vapor deposition and reactive ion etching,and also used conductive ink to realize the fabrication of flexible circuits,preliminary verification of the feasibility of pen-direct-writing for micro-nano manufacturing,It is very important for the development of micro-nano manufacturing.