Preparation And Properties Of TiN Hard Films Deposited On Glass Substrates By Magnetron Sputtering Method

Being the first commercially utilized hard film material,TiN is widely used in the surface of cutting tool,mold,alloy steel for its high hardness,high melting point,high wear resistance,unique gold and other properties,and it is the ideal protective layer for materials.However,previous research of TiN films mainly focused on the surface of metal materials while application of TiN films desposited on glass substrates was relatively less,it was mainly due to the different nature between glass and TiN films,which led to the poor adhesion of TiN films desposited on glass substrates.Therefore,this paper tried to deposit Ti buffer layer between glass substrates and TiN films to improve the adhesion of them,and applying TiN films to the surface of glass to enhance the hardness of glass substrates.In this paper,TiN films were desposited on the surface of glass substrates by reactive magnetron sputtering,The mechanism of Ti buffer layer improving the bonding strength between glass substrates and TiN films was studied.Morever,The effects of N₂/Ar flow ratio,sputtering pressure,sputtering time,sputtering power and substrate temperature on crystallization behavior,morphology,hardness and optical transmittance of TiN films were discussed,the main conclusions were drawn as follows:?1?The hardness of TiN films mainly depended on the density of films,the size of particles,the ratio of Ti/N.When the preferential orientation of TiN films was?200?,the shape of particles was spherical,the particles were small and orderly arrangement,TiN films were high density.Therefore,the property of hardness was excellent.If the ratio of Ti/N of films was too high or too low,it was not conducive to the improvement of the hardness of TiN films.When the ratio of Ti/N was close to 1,the property of hardness of TiN films was best.?2?The optical transmittance of TiN films mainly depended on the thickness of films and the ratio of Ti/N.When the thickness of films was thick and the ratio of Ti/N was high,TiN films tended to have low optical transmittance.?3?The Ti buffer layer can effectively reduce the stress of TiN films desposited on glass substrates.It also can improve crystallization properties of TiN films.Morever,the thickness of Ti buffer layer had a significant influence on the hardness of TiN films.When the thickness of Ti buffer layer was about 65 nm,the stress of TiN films can be reduced from 18.89 MPa to 9.84 MPa,and under this thickness of Ti buffer layer,the hardness of TiN films was highest.?4?The deposition parameters affected the hardness of TiN films.I got the best deposition parameters of the highest hardness of TiN films:the thickness of Ti buffer layer was 65 nm,the N₂/Ar flow ratio was 1:1,sputtering pressure was 0.5 Pa,sputtering time was 120min,sputtering power was 200 W,and substrate temperature was 200?.Under the best deposition parameters,TiN films desposited on glass substrate had a maximum hardness?795 HV?,which was 135 HV higher than the glass substrate,and the average transmittance of the visible light was 30.9%.