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Performance of biocompatible aluminum oxide films deposited by AC magnetron sputtering at low temperatures

Posted on:2011-01-05Degree:M.SType:Thesis
University:University of ArkansasCandidate:Ruiz Flores, Ana CarolinaFull Text:PDF
GTID:2441390002464370Subject:Engineering
Abstract/Summary:
In this work, the performance of aluminum oxide (A1,03) films deposited at low temperatures for biomedical applications was investigated. Due to its excellent physical properties, aluminum oxide is one of the most attractive materials in the biomedical industry.;This work focused on the performance of alumina films with respect to surgical cutting devices and implants. Alumina films were deposited at low temperatures, around 350°C, by AC inverted magnetron sputtering technique. The films were deposited at various oxygen partial pressures and power. In this work, XRD, TEM, and SAD technologies were used to characterize the films. Several tests were carried out to study the performance of alumina-coated substrates.;In this study, mixed phase alumina coatings were deposited on silicon, stainless steel, Ti-6A1-4V, and nickel-coated TEM grids. It was observed that coating substrates with alumina improves the corrosion resistance of the substrate material. Alumina films also showed a reduction in the amount of residual protein adsorbed when compared to uncoated substrates. Adhesion test results suggest that the presence of titanium nitride improves the adhesion of alumina films to the substrates.;Future work will investigate methods to improve the adhesion of aluminum oxide films.
Keywords/Search Tags:Films, Aluminum oxide, Deposited, Performance, Low, Work, Substrates
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