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Experimental and simulation results of a 0.15mum FlexFET transistor

Posted on:2011-03-30Degree:M.SType:Thesis
University:Tennessee Technological UniversityCandidate:Vasireddy, VivekFull Text:PDF
GTID:2447390002964366Subject:Engineering
Abstract/Summary:
Independent double gated transistors give better control of the channel and dynamic tradeoff between power and performance. An independent double-gated (IDG) FlexFET transistor is simulated using the Silvaco Atlas tool and the results are then compared with the data obtained from experimental devices manufactured by American Semiconductor Inc. (ASI). A reasonable correlation between the simulations and the experimental devices is obtained, following careful calibration of the simulation parameters. The bottom gate control factor (f) (i.e. the ratio of the change in threshold voltage to the change in bottom gate voltage) is observed to be around 0.3. The simulator is calibrated to match the experimental results by changing several parameters.
Keywords/Search Tags:Experimental, Results
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