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Design and Optimization of a High Throughput Chemical Vapor Deposition System for Depositing Thin Films of Iron Pyrite for Photovoltaic Applications

Posted on:2014-12-08Degree:M.SType:Thesis
University:University of California, IrvineCandidate:von Wilpert, JasonFull Text:PDF
GTID:2451390005493449Subject:Engineering
Abstract/Summary:
Iron pyrite (FeS2) is a promising material to act as the light absorbing layer in a thin film solar cell. This thesis focuses on the design and optimization of a chemical vapor deposition (CVD) chamber capable of depositing iron pyrite thin films by the reaction of iron acetylacetoneate and tert-butyl disulphide in argon at 300 °C at a base pressure ranging from 10 mTorr to 760 Torr. A custom, as-built 5" CVD system is first characterized by performing experiments attempting to deposit thin films of iron pyrite at a base pressure of 10 mTorr. After initial efforts are unsuccessful, a series of modifications are made to the system, and experiments at both low and atmospheric pressure are pursued. It is found that an external chamber for the iron acetylacetoneate precursor is necessary for better control over its vapor pressure, and that the growth rate must be slow to deposit homogeneous films. Optimal results at atmospheric pressure are achieved when the flow lines of the TBDS vapor, iron acetylacetoneate vapor, and argon carrier gas are combined prior to the deposition chamber.
Keywords/Search Tags:Iron pyrite, Vapor, Thin, Deposition, Iron acetylacetoneate, System
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