Research On Uniform Control Of Target Surface Temperature In Arc Ion Plating

Arc ion plating is one of the most important technology in industrial coating production and scientific research.The arc ion plating technology development rapid and wide application,which shows a lot of economic benefits and industrial application prospect.A number of reason account for it,such as the simple structure and process,the high ionization rate(70%80%),the high energy of incident particles,the well diffraction and it can realize low temperature deposition.Arc ion plating developed since the 1960s.Due to the development of technology as well as the increase requirements of peoples in craft,macro-particles and better utilization of target has become the key issues,which restrict arc ion plating technology further development and application.In this thesis,author built a platform of magnetic field control,in which contain the control chain of PC-PLC-magnetic.For the control chain of PC-PLC,the portion of which exchange data by communication protocol.Now,author exploit a communication software by VB.NET in order to build a more convenient circumstance of the basis experiment.Which also is beneficial to the control model of target surface temperature.The core of the program if the communication between PLC with computer,for which we can changing the output voltage size by command frame.All in all,we do that in order to get a reasonable target surface magnetic field distribution.With the purpose of decreasing macro-particle in arc ion plating,a variety of arc source structure appears.In all source structure,the most importance point is the change of the magnetic field distribution.In this thesis,author focuses on analysis the magnetic field distribution in target surface of the eccentric arc source and the axisymmetric arc source.On one hand,through the experimental observation proves the rationality of the existence of "zero line".on the another hand,we combine the simulation result of the target surface magnetic field distribution with the real trajectory of arc spot as well as the voltage of coil.Basing on this relationship,we provide the feasibility control of target surface magnetic field.Starting from the experiment of axisymmetric arc source,the arc spot movement near the vertical magnetic field is zero when magnetic field is strong enough.Basing on that phenomenon,we combine the relationship of voltage and the radius of trajectory in equation.Meanwhile,we divided the target to different area,in each area we experiment different voltage in varies frequency or different waveform to be exact.Finally get the target surface temperature distribution through the Beijing JIA HENG CCD camera.In detail,we want to build the relationship between the temperature uniformity with the macro-particles or waveform.In a word,all we did is to establish an optimal process parameters of target surface temperature control.