The Research Of Magnetron Sputtering TiAlSiN Film And Gradient TiAlSiN Film And Its Performance Study

With the development of science and technology,the single bimetallic ordinary TiN film already cannot satisfy the industry demand for the use of the film,the need for higher mechanical properties of the film makes the performance of the tool film to the direction of high adhesion and high hardness.Under these requirements,in order to obtain better performance,people consider the binary TiN film doped with new elements to form multiple composite transition metal compounds to improve all aspects of performance.In this paper,TiAlSiN thin films were fabricated by using TiAlSi target(Ti atom:Al atom:Si atom is 65%:25%:10%)by magnetron sputtering equipment with nitrogen.Better with better prospects for development and use value.TiAlSiN thin films have better development prospect and application value compared with TiN thin films.In this paper,TiAlSiN thin films were prepared on a stainless steel substrate by magnetron sputtering using a multi-functional vacuum coating machine,which overcomes the shortcomings of the traditional TiN films,and solves the problem of hardness.The effects of power,nitrogen partial pressure,time and temperature of the sputtering layer on the hardness,roughness characteristics adhesion,grain size diffraction peak and Roughness characteristics of TiAlSiN and its graded films were investigated by means of orthogonal test and SEM,automatic scratch tester and AFM.The results show that the optimum nitrogen partial pressure is 0.04 Pa,the hardness is 2318 HV,the bonding force is 19.3 N,and the mechanical properties of TiAlSiN thin films are studied on the basis of comparison with TiN thin films.The results of orthogonal test show that the hardness and bonding strength of TiAlSiN films are affected by power and nitrogen partial pressure,of which nitrogen is the most important factor.Control nitrogen flow rate on the performance of thin film.Effect of nitrogen flow rate on the hardness is hardness increases with the increase of nitrogen flow rate when the nitrogen flow rate is lower than 12sccm,when nitrogen flow rate is greater than 12 sccm hardness decreases slowly with the increase of nitrogen flow rate.The nitrogen flow effect on the binding force is when nitrogen flow rate at low binding capacity with increasing nitrogen flow rate decreases continuously when the nitrogen flow rate is greater than 12 sccm binding increased.The effect of combined hardness and binding force was determined,and the optimum nitrogen flow rate was determined 12 sccm.The hardness of TiAlSiN film is 4097 HV and the binding force is 18 N.On this basis,design the nitrogen flow gradient film.Experimental results show that the nitrogen flow rate increasing and the gradient film time increasing is better.The D-7 process increase the maximum binding capacity,compared to monolayer film adhesion is improved.Its binding force can reach 42 N,hardness due to the design of the gradient film slightly decreased,3428 HV,the overall performance is better.