Microstructure And Mechanical Properties Of High Entropy CrMoNbTaZr(N_x) Alloy Films By Magnetron Sputtering

In recent years,with the development of multi-principal component and complex component alloys,high entropy alloys have attracted the attention of scholars at home and abroad.Compared with traditional alloys,high entropy alloys have better mechanical properties and structural stability,such as high strength,low-temperature toughness,good thermal stability,and radiation resistance.The high entropy alloy is formed by adding a variety of metal elements with equal or near-equal atomic ratio of multi-principal element alloy,which has a very wide application prospect in the field of superalloys such as aerospace and integrated circuit diffusion barrier layer.In this paper,the method of co-sputtering with two targets is used to prepare CrMoNbTaZr and(CrMoNbTaZr)N_x films on the monocrystalline silicon substrate.Use X-ray diffraction,X-ray photoelectron spectroscopy,scanning electron microscope,transmission electron microscope,atomic force microscope,four-point probe tester,and nanoindenter to characterize the phase structure,microscopic morphology,composition,mechanical properties,and resistivity of the film.First,the influence of different substrate temperatures on the structure and properties of the film was studied,and then the influence of in-situ annealing at 500?on the structure and thermal stability of the film was analyzed.On this basis,the(CrMoNbTaZr)N_x film was prepared with a substrate temperature of 300?,and the effect of nitrogen content on its deposition rate,chemical composition,crystal structure,surface roughness,mechanical properties,and resistivity was studied.Research indicates:With the increase of substrate deposition temperature,the sputtering efficiency of CrMoNbTaZr film first increases and then decreases.The film structure is mainly amorphous,and a small amount of intermetallic compounds appear in the film at high temperatures.The roughness of the film gradually decreases with the increase of the substrate temperature,reaching a minimum of 0.226nm at 300°C.The maximum strength and elastic modulus of the film are 158±5.2GPa and 14.6±0.1GPa,respectively.The resistivity of the film gradually increases with the increase of the substrate deposition temperature,and the highest is 145??·cm.After annealing,the CrMoNbTaZr films all have laves phase intermetallic compounds,and the roughness of the film gradually decreases.After annealing,the hardness of the film increases,and the elastic modulus decreases,which improves the friction and wear resistance.After annealing,the resistance of the film in the base state is reduced,and the minimum is 8??·cm.With the increase of nitrogen content,the deposition efficiency of(CrMoNbTaZr)N_x film decreased greatly,from 30.57 nm/min to 11.47 nm/min,and the structure showed a crystalline transition of"amorphous-FCC solid solution-amorphous";The hardness and modulus of elasticity first increase and then decrease,with the maximum values being 30.5±0.5GPa and 264±15GPa,respectively.The friction coefficient of the film gradually decreases,from 0.13 to 0.05.The change of film resistivity is divided into two stages.When R_N=0-28%is the first stage,the film resistivity first increases and then decreases.The maximum and minimum values are193??·cm and 8??·cm,respectively.When R_N=32-40%is the second stage,the resistivity of the films increases by four orders of magnitude to 33551??·cm and 34162??·cm,respectively...