Study On Preparation And Properties Of ZnO-based Thin Film

The purpose of this thesis is to obtain ZnO-based photovoltaic glass with self-trapping function and excellent photoelectric performance and its preparation process.The Aluminum-doped zinc oxide(AZO)film and Gallium-doped zinc oxide(GZO)film with excellent photoelectric performance are prepared by adjusting the process parameters.The working pressure and radio frequency are mainly studied and discussed.Effects of changes in parameters such as power ratio and sputtering power on the crystal structure,light transmittance,resistivity,and growth morphology of ZnO-based films,and the process was enlarged to a pilot line of magnetron sputtering to obtain an AZO film with excellent photoelectric performance And GZO thin film,and then a wet etching method and a microstructure template method are used to prepare a ZnO-based photoelectric glass with self-trapping function.The effects of the energy provided by different process parameters on the structure of AZO films and GZO films were studied.Through analysis of SEM,XRD,contact angle meter,Hall effect detector,color difference meter,and ultraviolet spectrophotometer,it was found that the working pressure on AZO The film growth structure,film particle size,and film hydrophilicity have a greater impact;at the same time,it has been found that the RF power ratio has a great impact on the growth method of AZO films,and the RF power ratio increases,which improves the dissociation of the deposited particles and promotes the AZO film The crystallinity and compactness are correspondingly improved,and the conductivity and light transmission properties can be improved.It was found that the sputtering power has a greater impact on the kinetic energy of GZO film deposition,the sputtering power increases,the film resistivity decreases,the optical band gap widens,and GZO The film has better conductivity than AZO film.At the same time,the ZnO-based thin film with excellent performance and stability was obtained through the pilot line of magnetron sputtering.The surface microstructure of the ZnO-based thin film was adjusted by the wet etching method and the microstructure template method,and ZnO with self-trapping function was obtained.Base photoelectric glass.