Preparation Of Molybdenum Disulfide Films By Magnetron Sputtering

Since its discovery,graphene has been extensively studied due to its unique optical and heat conduction properties.However,because it is a natural zero-band gap structure,people try to explore new two-dimensional materials,such as boron nitride(BN),black phosphorus(BP),transition metal sulfide(TMDCs),etc.have come into people's vision.As a representative of transition metal sulfur compounds,two-dimensional Mo S₂has a layered structure,a single layer of Mo S₂is a direct band gap,and has a good absorption in the visible light band.Its unique semiconductor characteristics make it have broad application prospects.In this paper,Mo S₂thin films were prepared by magnetron sputtering combined with vulcanization,and their optical properties were studied.The main research contents and results are as follows:(1)Mo S₂films were prepared by magnetron sputtering combined with vulcanization process.Its phase structure,morphology and optical properties were characterized and analyzed.The results showed that the films prepared under the conditions of background vacuum is better than 5×10^-5Pa,DC magnetron sputtering power is 10W,Ar atmosphere,working pressure is 1Pa,the distance between substrate and target material is about 6 cm,sputtering temperature is 400?,sputtering time is 400s,vulcanized at 600?for 30 min are four layers of Mo S₂with good uniformity.(2)The effect of the distance between substrate and target material on the structure and morphology of Mo S₂films was studied.Mo S₂thin films were prepared by adjusting the distance.The results showed that with the increase of the distance between substrate and target material,the absorptivity,crystallinity and grain size of the film decrease gradually.After sulfurization,the Mo S₂film is 2H-Mo S₂structure.When the distance between substrate and target material is 7.0cm,the grain distribution is more uniform and the mean square roughness is the lowest.(3)The influence of substrate material on the grown Mo S₂films was studied.Mo S₂thin films have been grown on quartz(Si O₂)and p-type silicon(100)substrates,respectively,and their phase structure,morphology and optical properties have been characterized.The results showed that Mo S₂films with large grain size and fewer layers can be prepared on Si substrates.(4)The effect of sputtering time on the optical properties of Mo S₂thin films was studied.The results showed that the absorptivity of the films decreases gradually with the shortening of sputtering time,When the sputtering time is 250s,Mo S₂films with good quality can be obtained.(5)The effect of sputtering temperature on the morphology of Mo S₂films was studied.The results showed that the crystallization of the thin film increases firstly and then decreases with the increase of sputtering temperature.When the sputtering temperature is 400?,Mo S₂films with good quality can be obtained.