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Study On The Dose Effects Of Wheat After Implantation And Wheat Protein Genetic Characters Of The Offsprings Via Ion Beam

Posted on:2004-09-15Degree:DoctorType:Dissertation
Country:ChinaCandidate:W D WangFull Text:PDF
GTID:1103360125457312Subject:Condensed matter physics
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First of all, using wheat variety (line) Jian 54,Yunong 118 and Yumai 18 as material, wheat livability and seeding growth that were influenced by vacuum and temperature of the target room in the implantation process were studied. And then, by using different ratios dose and different doses ion implantation in the experimental material, wheat seeding growth and morphological changes were measured, analyzing the difference of the POD, CAT and POD of the 3-leaf period with gel electrophoresis technology. In view of the results of the wheat scarfskin SEM, the right doses of ion beam was decided as mutation or transformation dose. Finally, by analyzing the protein content of the off springs that were transferred with soybean total DNA via ion beam the protein genetic characters and behavior of the offsprings were summarized.From the study, there was little influence on livability of seeds in the vacuum situation, and livability of seed is over 90%. The influence of temperature on livability increase with the increasing of the dose rate: in the dose rate of 1mA, influence of dose on seeds was similar to effect of vacuum. While if the dose rate added to 2mA or 3mA, the longer implantation time the lower livability. Ion beam implantation and temperature affected livability alike, In the dose of 7.2x1017N+/cm2 the livability decreases to 60%~70%. When it came to the young plants quality, there was higher seeding GS vigor than the control at the vacuum or 1mA dose rate. Perhaps, the stimulation made so. With the increase of the dose rate, the seeding GS vigor raise first and then decreased, it was indicated that high dose rate restrained the activity of seeding. In contrast to the growth influence of temperature, the radiation of ion beam damnify the seeding more serious than temperature. There were variations in wheat seeding after implantation. They embodied in cholorophyll defect in nervation and morphological aberrance of plants. The CV of the height of plants andthe length of the first leaf are increased with the increase of dose. It was founded that the differences in the different dose rate were significant, and with the augment of ion beam dose damage were enlarged sharp. Different wheat variety had different sensitivity to ion beam implantation.From the results of the POD, CAT, SOD enzyme activity and pattern in 3-leaf period of wheat, CAT and POD enzyme activities were stronger than the control's; but SOD change had a little difference, SOD activity was also stronger than the control's whereas in the low dose when dose was higher than 5.6x1017N+cm-2 the activity lower than the control's. In the process of the dose increased, the enzyme activity is up and then down. For the influence of ion beam on the isoenzyme pattern, the main character was the main band color is deepened and widened, and those soft color bands, if they were in the different doses, some were exist and others display very weak color. When the dose was added to a right figure (>5.6x1017N+cm-2 ), the enzyme activity is down gradually. In a whole, the changes enzyme activity and isoenzyme pattern were partly relate to the damage of wheat seeding growth.Through SEM observation of the wheat seeds' scarfskin, it was displayed that if the dose was less 1x 1017N+/cm2, the skin of seeds have few change; if the dose between 1 x1017N+/cm2~3x1017N+/cm2, there was a few changes on the skin of seeds; and if the dose added to 3X1017N+/cm2-5X1017N+/cm2, damage could be seen clearly, there were holes in the skin. In the last, if the dose got to 5 X 1017N+/cm2~8 x 1017N+/cm2, the damage degree of skin the ion beam impress on was very deep, and there were many holes in the skin.Combining the changes of morphology, isoenzyme analysis and SEM observation, it's better to use the dose rate of 2mA or 3mA and dose form 3 X 1017N+/cm2 to 5x1017N+/cm2 to assist heterogeneous DNA to transfer in wheat seeds, and then, if used ion beam to mutate wheat plants, the right dose rate and dose individually are 2mA or3mA and above 6 X 10I7N+/cm2.By analyzing the protein...
Keywords/Search Tags:Wheat, Ion Implantation, Dose(rate), Morphological change, Isoenzyme, The offsprings after transformation, Protein genetic characters
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