The Preparation Studies Of Graphene And Graphene Oxide Composite Structure Vapor Deposition

Graphene which is found in recent years,a kind of two-dimensional carbon atoms in crystal,is made up of hexagonal mesh structure carbon atoms.It has the perfect crystalline,is the basic units to build other carbonaceous materials of different dimensions.It is the basic structure of zero dimensional fullerenes,one dimensional carbon nanotubes,such as three-dimensional phase graphite carbon,has many unique properties.Due to its unique electronic,optical,mechanical,thermal properties and become a multiple discipline research materials.These properties make graphene has a broad prospect of research and huge available values,there are huge potential application in many fields.In numerous methods of the synthesis of graphene,chemical vapor deposition?CVD?,as the main method of preparation of large area high quality graphene were well studied and widely used.In order to study the method of graphene oxide composite ordered structures by vapor deposition and its performance,this thesis use the method of chemical vapor deposition?CVD?,and graphene films preparation and the properties were studied.Copper foil as basal,methane as carbon source,using plasma enhanced chemical vapor deposition?PECVD?technique system deposit graphene films at low temperature.And by adopting the method of spin coating,transfer the preparation of the graphene films to the target substrate.Using Raman spectroscopy,scanning electron microscope?SEM?,transmission electron microscope?TEM?,X-ray diffraction phase analysis?XRD?,electrochemical workstation on the characterization.Because of CVD of graphene films prepared by the original equipment exist defects and deficiencies,in detailed understanding and mastering the experimental principle and the basis of experiments research,we have developed and transformed the original devices.To reform,add and link the component to each part In the control of temperature,control of electrode,control of gas arrangement,etc.Efforts to construct a set of complete and orderly preparation of graphene chemical vapor deposition system.The detailed schematic diagram and the actual diagram describe each part of the transform component,structure and connection mode.And use the system for the preparation of graphene films.Using the method of magnetron sputtering,growth in the preparation of the graphene surface oxide film,and study its performance.On the surface of the ITO deposit WO₃ thin films.Introduce the formation mechanism of the anodic alumina template and the concrete application,detailed in the preparation of porous anodic alumina process under the condition of laboratory.Orderly rules prepared by twice anodic oxidation method of hexagonal pore structure.Compare the difference between the anodic oxidation and the second preparation of anodic oxidation template.At the same time,comparison of different expanding time impact on anodic aluminum oxide template.For the preparation of Graphene-based oxide and composite Anodic Aluminum Oxide Template,using CVD method for graphene films growth and transfer of graphene films.Try to explore the magnetron sputtering method in the preparation of different oxides,Graphene-based deposition and its growth in the composite Anodic Aluminum Oxide Template.