Font Size: a A A

Dynamic Simulation And Technologic Parameters Optimization Of Ultra-Precison Planar Polishing Machine

Posted on:2008-01-20Degree:MasterType:Thesis
Country:ChinaCandidate:S W WenFull Text:PDF
GTID:2121360215493373Subject:Mechanical Manufacturing and Automation
Abstract/Summary:PDF Full Text Request
As one of the key technologies in developing manufacture, ultra-precision polishing is applied in broad areas, such as aviation, spaceflight, integrate circuit, military affairs, demotic equipment and so on. Presently, the technology in our country is far away behind the developed countries. The polishing theories are not further studied, and the most polishing process technics is depended on experience which leads to low production efficiency. The paper is supported by Advanced Manufacturing Technology & Equipment Zhejiang Provincial Key Disciplines. It further studies the polishing process with virtual prototype which has been fast developed and widely applied. The relations among technologic parameters of polishing machine, the characteristic of workpiece movement and polish quality are discussed. Its main work is as follows.(1) Studying on chemical-mechanical polishing effect and polishing machine structure, the theoretic dynamic model is established. And then with the co-modeling technology of 3D modeling software SolidWorks and dynamic analysis software ADAMS, the virtual prototype is set up and defined completely.(2) Via qualitative analysis and quantitative validation, the prototype is verified. And model adjusting insures good veracity. With simulation, it studies the relations between parameters of polishing machine and status of workpiece movement, and also the relations of movement among each point on surface of workpiece. The work is a foundation for the further evaluation of polishing results.(3) It provides an evaluation system with the criterions of Preston's remove rate formula and moving track style of workpiece. It studies the polishing technics, such as polishing pressure, velocity, planetary rotation, and their effect on the two criterions. The relation between them is exposed. On the condition, it works out the optimum value for each technologic parameter after optimization design. And the result is approved in practice.The methodology and results in the paper are not only have an actual application in technologic parameters selection, but also make a firm basis in further research.
Keywords/Search Tags:CMP, virtual prototype, dynamic simulation, polishing remove rate, movement track, optimization
PDF Full Text Request
Related items