Study And Application On Compound Photoinitiator System

The photosensitivity is vital important for the photosensitive polymer materials. The initiation system with high active photosensitivity is the current topic. In this paper a compound photoinitiator system and application for photoresist were studied. Several sensitizers and hydrogen donors were selected, polymer was synthesized and imaging properties of the photosensitive imaging system were investigated.Several sensitizers and hydrogen donors were used with hexaarylbiimidazole as photoinitiator system. The photocuring properties, especially the photoinitiator system composed photosensitivity of photoinitiator system exaarylbiimidazole/ N,N-tetraethyl-4,4'- diaminobenzophenone(EMK), hydrogen donor N-phenylglycine(NPG) and hexaarylbiimidazole(BCIM) were studied. The research results suggested that the BCIM/EMK/NPG system was most efficiency.The photocuring process of MMA was monitored using dilatometer. The curing kinetics was found to be affected by various factors. The effect on volume shrinkage by the concentration of BCIM, EMK, NPG and MMA was determined and the polymerization rate was achieved. The research results suggested that the exponent of hexaarylbiimidazole was 0.68, the exponent of EMK was 0.043, the exponent of NPG was 1.68 and the exponent of MMA was 0.99.Styrene/ Maleic Anhydride resin was synthesized. The effects of reaction time, reaction temperature, the catalysts and its dosage were investigated by determination of acid value. The structures of the synthetic polymer were characterized using IR spectroscopy. The properties of the photoresist which using the synthetic polymer were determined.The compound photoinitiator system was applied in photoresist. The influences of hydrogen donors, photoinitiator dosage, different photoinitiator system and exposal energy on photoresist's curing properties, imaging properties, stability and other properties were studied.