| Three kinds of non-ionic photoacid generators (PAG): Phthalimidotosylate, N-hydroxy-5-norbornene-endo-2,3-dicarboximide methylic sulfonate and N-hydroxymal -eimide adduct of furan methylic sulfonate were synthesized from hydroxylamine hydrochloride, anhydride and p-toluenesulfonyl chloride as raw chemicals. The synthesis conditions of some intermediate compounds were optimized and improved. The product chemical structures were characterized by FT-IR and 1HNMR. Three photoacid generators (PAG) synthesized were evaluated in terms of miscibility with solvents, thermal stability and the UV absorption properties in liquid and polyethylene glycol film. The experimental results showed that Phthalimidotosylate and N-hydroxy-5-norbornene-endo-2,3- dicarboximide methylic sulfonate possessed good solvent miscibility, thermal stability, UV absorption property, and Phthalimidotosylate revealed better performances than N-hydroxy-5-norbornene-endo-2,3-dicarboximide methylic sulfonate, they are good potential for application of photo lithography process up to 150℃.Three photoresistor monomer, such as N-phenylmaleimide, N-(p-hydroxyphenyl) maleimide and N-phenyl-methacrylamide were synthesized at 2L with industrial grade chemicals. And two kinds of UV photoresist matrix resin poly styrene-co-N- (4-hydroxyphenyl) maleimide and poly-N-phenylmethacrylamide-co- N-(p-hydroxyphenyl) maleimide were formulated. The chemical structure of the resins were characterized by FT-IR and 1H NMR, the thermostability was tested and the results showed the glass temperatures (Tg) above 250℃.Two UV positive photoresists were formulated from our photoacid generators and matrix resins, photolithography process experiment results demonstrated that two photoresists had high thermostability up to 250oC and the resolution to 1μm.
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