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Research On Acid-labile Monomers Of193nm Photoresist

Posted on:2012-10-23Degree:MasterType:Thesis
Country:ChinaCandidate:J L ZhangFull Text:PDF
GTID:2181330467477981Subject:Chemical Engineering
Abstract/Summary:PDF Full Text Request
Photoresist is the key material of Ultra Large Scale Integrated Circuit. At present, research focused on etching several decades nanometer high resolution193nm photoresist on silicon, Intel has successfully193nm photoresist for immersion lithography machine as a lithographic apparatus mainstream, but our country193nm photoresist technology is not mature, the presence of cracks, surface roughness and non exposed area film partially dissolved swelling problem caused by plastic film.therefore, development and research on new typical and high efficient acid-labile monomers of193nm photoresist displays important theoretical and practical value.Adamantaneyl methacrylate is widely used among193nm photoresist matrix and acid-labile monomers. In the present study, four new acid-labile monomers of193nm photoresist, namely,2-methoxymethyl (ethoxymethyl, propoxyrnethyl, isopropoxy) adamantane-2-yl methacrylate, are designed and synthesized with the raw materials of adamantone, with the total yield of60%,50%,35%,20%, Preparation of compound purity was greater than96%,The acid-catalyzed degradation test is carried out, acid-catalyzed degradation rate of2-methoxymethyl adamantane-2-yl methacrylate is the highest, seven point three times of2-methyl adamantane-2-yl methacrylate. The structure of2-methoxymethyl adamantane-2-yl methacrylate is confirmed by X-diffraction, belonging to monoclinic system.The synthesis process of2-methoxymethyl adamantane-2-yl methacrylate is discussed. Effect of reaction conditions are studied. In addition to explore another synthesis of methacrylic acid (2-methoxy methyl-2-adamantane) esters, is synthesized by DMSO three methyl sulfide pyrylium salt, and King Kong ketone reaction for the synthesis of adamantane-2-spiro-ethylene oxide under alkaline conditions, the open loop intermediate2-methoxy methyl-2-Adamatane alcohol, dripping-methacryloyl chloride synthesis of methacrylic acid (2-methoxy methyl-2-adamantane) ester, and on2-methoxy methyl-2-adamantane alcohol purification are investigated.
Keywords/Search Tags:193nm photoresist, methacrylate, adamantone
PDF Full Text Request
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