Study And Application Of Novel UV Curing System

UV curing technology has become an important fresh activist of coating industry because it's many advantages, such as fast curing speed, less environment pollution and low energy consumption. UV curing system is composed of photoinitiators, oligomers, reactive diluents and various additives. Photoinitiators is a key component of the UV curing system, it play a decisive role in curing speed; UV curing resin is one of the largest components in UV curing system, it decision the basic properties of UV-cured product. The paper consists of the four parts as fellow:1.The ultraviolet photosensitive initiating system is composed of bis[2-(o-chlorophenyl)- 4,5-diphenylimidazole](BCIM), sesitizer N,N-bis(diethylamino)benzophenone(EMK) and hydrogen donors N-phenylglycine(NPG). Under the irradiation by high pressure mercury lamp, the relationship between the photopolymerization rate of MMA and concentration of each component of the system, including BCIM, EMK, NPG and MMA, was studied. The good results have been obtained through studying the system's application on liquid photoresist.2. Four novel kinds of cationic macrophotoinitiator were synthesized, they were poly- (styrene-iodonium-co-methylmethacrylate) hexafluoroantimonate(COPSMI), poly(styrene- iodonium-co-butyl acrylate) hexafluoroantimonate(COPSBI), poly(styrene-iodonium-co- hydroxyethyl acrylate) hexafluoroantimonate(COPSHI) and poly(styrene-iodonium-co- poly(ethylene glycol) methyl ether methacrylate) hexafluoroantimonate(COPSPI). The products were then characterized by 1H-NMR, FTIR, GPC, DSC and UV-Vis spectrum, et al. Their photoinitiation activities, resolution and relative migration were studied; the results showed that they had good photosensitivities, good resolution and low relative migration.3. First, the cresol novolac epoxy acrylate(JFA) was synthesized by the raw materials of epoxy resin(E202), acrylic acid, and then using tetrahydrophthalic anhydride modified the JFA resin, the carboxylated cresol novolac epoxy acrylate(CJFA) was obtained. The effects of reaction temperature, the catalysts and its dosage, the inhibitors and its dosage were investigated. The optimum reaction conditions were following: the first reaction temperature was 100~105℃, and the second reaction temperature was 95℃, triphenylphosphine as catalyst with dosage of 0.4 %wt, 4-hydroxyanisole as inhibitor with dosage of 0.1~0.2 %wt. The good results have been obtained in the application of the above system on photoimagineable alkali developing solder resist ink.4. First, 7-hydroxy-4-methyl coumarin was synthesized; second, half blocked IPDI-CM was synthesized using IPDI and 7-hydroxy-4-methyl coumarin; third, amphiphilic acrylate resin(P(St-HPMA-DM-EHA)) was synthesized using styrene(St), 2-hydroxypropyl methacrylate(HPMA), 2-(dimethylamino) ethyl methacrylate(DM) and 2-ethylhexyl acrylate(EHA); finaly, self-photoinitiating amphiphilic photosensitive resin(P(St-HPMA- DM-EHA)-IPDI-CM) was synthesized using half blocked IPDI-CM modified P(St-HPMA- DM-EHA). The photosensitive, emulsification of P(St-HPMA-DM-EHA)-IPDI-CM and properties of coating were studied; the results showed that P(St-HPMA-DM-EHA)-IPDI-CM had good photosensitive, good emulsification, and the coating had good properties.