| Magnetron sputtering has already been one of the most important tenchniques in coating industry and there are many researchs on magnetron sputtering. This essay mainly deals with two part: calculating and optimizing the magnetic distribution and c the particle movement of the initial sparking stage.First we give some brief statements on typical magnet design and sparking in electromagnetic sputtering. Then the magnetic distribution of typical magnet arrangment is calculated with Comsol 3.2a. Also the result is anaylsed afterwards. Three methods are considered to optimize the magnetic distribution : place single and double magnetic rings between the south and north poles, place soft magnet behind the target. The single ring method is to place a magnetic ring between the south and north poles and assume it as south pole or north pole in two calculations. Two magnetic rings are placed between the south and north poles in double rings method. As for every optimizing method, the essay analyses the influence of all structure parameters on the horizontal magnetic distribution and intensity. The parameters such as loaction ,dimension and surplus magnetization are also changed to get the magnetic distribution and the magnetic intensity of the target surface. According to the overall requirement, I choose the parameters: h=0.016m,Br=1.2T,w=0.006m ,draw forth the magnetic intensity of sparking field and use them to simulate the particle movement.The the essay simulates the particle movement and distribution in initial sparking, tracing the movement of electrons and ions and get the electrons and Ar~+ location distribution according to the movment and collision of massive electrons and inertia molecules.This essay put forwards methods to optimize the traditional magnetic distribution and calculate the gas sparking in initial sputtering stage. All these have important referable meaning for the design of sputtering equipment and research of sparking in sputtering field. |
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