Structure And Properties Of Hydrogenated Amorphous Silicon Thin Films By R.F And D.C Magnetron Sputtering

The silicon films solar cells have been concerned in the field of PV at present. Compared with crystal silicon solar cells and polysilicon solar cells,the silicon-based film solar cells have less silicon materials consumption and much lower cost,especially,the application of low-cost substrates makes it more competitive in cost-control.Amorphous silicon thin film solar cells have a lot of advantages,such as simple fabrication.It can not only be made at low temperature on cheap substrate,but also decrease the fabrication cost.Furthermore,the integration and big area process is available.Besides,it's easy to combine with the construction to compose the BIPV System.So it has been widely studied in the recent years.In this thesis,a-Si:H films were deposited on sods-lime glass substrates by DC and RF magnetron sputtering.The structure,thickness,Si-H bond and optical transmittance were measured by X-ray diffraction(XRD),NKD films analysis, Fourier-transform infrared spectrometer(FTIR),Raman scattering(Raman) and UV-vis spectrometer,respectively.The structure and properties of the films were studied by changing the power,substrate temperature and partial pressure of hydrogen during the sputtering.The results are shown as following:1.The deposition rate increases gradually with the increase of the sputtering power.But the increasing tendency will slow down as the sputtering goes on.The increasing thickness of the film causes the decreasing of the visible light transmittance.The optical band gap dropped with increase of the sputtering power.2.Below 300℃,the deposition rate,the total visible light transmittance and the optical band gap of the film do not change with the increase temperature of the substrates.3.With the stable argon pressure,the increasing hydrogen pressure leads to the slower deposition rate at which thinner film can be obtained in the same sputtering time.Therefore the visible light transmittance will go up.The optical band gap will increase as the hydrogen pressure rising. 4.X-ray diffraction(XRD) and Raman scattering(Raman) shows the structure of the film is amorphous.But the optical band gap of film is about 1.9～2.0eV by calculating the UV-visible light transmittance spectra.So we deduce that the films is mainly amorphous structure with little nanocrystals embedded in.5.Comparing the two sputtering power supply,the deposition rate of D.C magnetron sputtering is much higher than that of R.F magnetron sputtering. However the film deposited by R.F magnetron sputtering has better uniformity and compactness.