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Research On MOCVD Heating System

Posted on:2009-02-26Degree:MasterType:Thesis
Country:ChinaCandidate:S B ZhanFull Text:PDF
GTID:2132360278963969Subject:Engineering Thermal Physics
Abstract/Summary:PDF Full Text Request
Metal organic chemical vapor deposition (MOCVD) is a key equipment in the manufacturing of semiconductor optoelectronic devices and microwave devices in industry. Heating system is a vital part of MOCVD. Specific heating device and thermal control technology is needed for each new reactor design. In this dissertation, the heating systems of existing MOCVD equipment were analyzed. The comparison between infrared radiation heating and high frequency induction heating was conducted, and their heating characteristics were investigated.The application and material of infrared radiation heater and high frequency induction heater were discussed from theory to practical application in this article. The structure of these two heaters was numerically designed and optimized. And the installation of them was also numerically analyzed. The results are as follows, For infrared radiation heater,1) For filament infrared radiation heater, temperature uniformity of the graphite susceptor surface is determined by the resistance wire placement. Rotation of the susceptor is essential, as it brought 20% increase of temperature uniformity for filament infrared radiation heating.2) For flake infrared radiation heater, temperature uniformity of the graphite susceptor surface is closely related with the resistance flake shape. The installation requirement of flake heater is lower than filament heater.3) Temperature uniformity was strongly dependent on parallelism of the heater and the graphite susceptor.For high frequency induction heater,1) Temperature uniformity is determined by the wire spatial distribution especially in outer coil wires.2) Heating uniformity of the heater is good. The temperature deviation of the graphite susceptor surface is only 0.3℃.3) The installation accuracy of high frequency induction heater is higher than infrared radiation heater. The parallelism of the heater and susceptor must be maintained well.To ensure safe and reliable operation of the equipment, high-temperature region must be isolated from the outside world. Based on the CFD technology, the geometric structure of the cooling system in MOCVD were determined and designed by simulation.
Keywords/Search Tags:Organic Chemical Vapor Deposition (MOCVD), infrared radiation heating, high frequency induction heating, cooling
PDF Full Text Request
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