The Technical Research Of Optical Film Deposited By Arc Ion Plating Technique

With the development of arc ion plating technology, it has become an extremely important technology category of thin film deposition.Arc ion plating has the advantages of improving the ionization rate, kinetic energy of the target and deposition rate, also free place and amount set of the target.Thus,it is booming in the industrial field,such as the field of mould,stainless steel sheet,steel tubes,lamps,metal products,finishing materials and so on.More over, the coating materials has developed to variety compound thin film from the traditional material of single chemical compound.Further development of multilayer composite coating, make it with a higher value of study and economy.Arc structure in arc ion plating was first optimized,enhance the tautness of soft metal by added a plate. With ceramic arc pins instead of the arc, the efficiency of arcs was improved. A stable arc and deflection field of arc source was designed and its magnetic field distribution was analyzed. The results showed that the design of the magnetic field can reach the role of deflect ions and eliminate "big grainy". The implementation of the control circuit is Discussed, the insulated-gate bipolar transistor drive circuits, multivibrator, and voltage comparison circuit were designed. The performance of the control circuit was simulated and tested, PCB circuit broad was produced and examined.Simulation and experimental results showed that: high voltage pulse was generated at the point of initial arc and the time of target extinguishing, when the starting arc is stable,the pulse signal can be closed, this can meet the design needs. During film, this can keep the target source arc steady and with a high stability, which can achieve the expected effect. When testing the PCB board, the circuit was found that the pulse waveform can easily be interference,and this need to be further improved.Finally, the influences of target current and the oxygen during the process of preparation on the depositon rate and surface roughness were studied,.The following results were obtained: when the arc is working properly,the target effect of current on deposition rate is very small,but the effect of surface roughness on film is great; oxygen component is reversed, the oxygen concentration do not unduly affect the size of the surface roughness of the film, but can change the thin film deposition rate to a great extent.For this reason, in the later preparation process, the thin film deposition rate can be controlled by changing the oxygen distribution,and the surface roughness can be reduced by changing the target current.