Font Size: a A A

Aluminum - Copper Oxide Preparation And Properties Of The Reactive Membrane

Posted on:2009-06-26Degree:MasterType:Thesis
Country:ChinaCandidate:N F DongFull Text:PDF
GTID:2191360245979382Subject:Applied Chemistry
Abstract/Summary:PDF Full Text Request
In this paper, Al bridge film and Al-CuO reactive multilayer bridge films were successfully deposited with magnetron sputtering process, where the aluminum and copper oxide were used as target .The effects of sputtering power and sputtering pressure to the deposition rate and the quality of films were studied .The morphology, composition and structure of the thin films were investigated by SEM, AFM, EDS and XRD. The results showed that the deposition rate of Al bridge film and Al-CuO reactive multilayer bridge films increased almost linearly first with sputtering power, then increased slowly. On the other hand, the deposition rate increased with increasing sputtering pressure then decreased since it came to peak .XRD patterns show that all the films deposited are polycrystalline. SEM and AFM images of surface morphology showed that when the sputtering power was 150 W with pressure 0.4 Pa, the Al thin bridge films were uniformly compact, and also showed that when sputtering power was 206W with pressure 0.4 Pa, the Al-CuO reactive multilayer bridge films were smooth. The EDS showed the element of Al and CuO films were unitary, the content of impurity was little.The result of experiment showed that the best parameter to Al thin film was that the sputtering power was 150 W with pressure 0.4 Pa, and the best parameter to CuO thin film was sputtering power was 206W with pressure 0.4 Pa.The Al and Al-CuO bridge films were prepared under the best parameter ,then the temperature of the bridges was studied by double line method of atomic emission spectroscopy principle ,the results showed when the bridges were ignited, the temperature of plasma produced by Al-CuO reactive multilayer bridge films was higher than Al bridge. After ignition of bridge, the XRD patterns showed that Al film and CuO film had reacted and produced new matter Cu and Al2O3. The current-time curve showed that the peak current valve of Al bridge was lower than Al-CuO bridge.The result make us know that the energy released by multilayer bridge is more than Al bridge and prove that the multilayer bridge can react.
Keywords/Search Tags:science of material, multilayer, magnetron sputtering, ignition performance, chemical reaction, multilayer bridge, Al-CuO
PDF Full Text Request
Related items