Preparation And Growth Mechanism Of The Pattern Of One-dimensional Polymer Nanometer Array

The article exposes anodic aluminum oxide (AAO) template to UV to get patterned AAO template. The pattern is the same as anticipative design. After research, it is found that the best technology conditions of patterning AAO template whose diameter is 1cm are following: the spin photoresist volume is 0.2ml; the time of exposure is 50 second; the time of developing is 20 second. Besides, the smaller the pattern is, the harder the preparation of patterned AAO template. When the sizes of pattern are similar, the pattern with big space is easily prepared.After, preparing the patterned polymer nanotube arrays use the patterned AAO template as second template. The article adopts solution and melting polymer wetting AAO template to prepare patterned polymer nanotube arrays such as PS and PMMA, EVA and PE. The scanning electron microscopy (SEM) viewed the sample after the AAO template and residual photoresist are moved. The result indicates the pattern of polymer nanotube arrays is accordant with the anticipative design. Rigid polymer is suitable for pattern, and the nanotubes of the rigid polymer is erect and don't fall down. The growth temperature and reaction time are large influential with preparing patterned polymer nanotube arrays in melting wetting. In solution wetting, concentration and character of solution are important conditions. Preparing patterned PS and PMMA nanotube arrays are better.The article discusses the growth mechanism of polymer nanotube arrays in solution elementarily. It is found that length of polymer nanotubes are related with the concentration of solution, the appearance is decided by the viscosity, surface tension of solvent and volatility of impregnant.