| In this paper, Several thin films samples of Vanadium oxide were got by Vacuum vapor by pure V2O5 power as vapor source and high-frequency Magnetron sputter by high pure metal vanadium. During vapor and sputtering, change of pressure & time of vapor and sputtering and process parameter results various samples. On the condition that Ar and O2 were in proper proportion rate, the properties of sample was changed. Heat treatment in vacuum was also studied. The resistance and resistance-temperature parameter of the sample is measured. The measurement results showed that the heat treatment decreased the square-resistance greatly. At last the XPS was used to analyze the composition of the films. |
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