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Study On Characteristics And Morphology Of Cobalt And Aluminum Nitride Films Prepared By Chemical Vapor Deposition

Posted on:2012-03-16Degree:MasterType:Thesis
Country:ChinaCandidate:L H Z XiaoFull Text:PDF
GTID:2231330362468265Subject:Materials Science and Engineering
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This thesis is intended to study on diluted magnetic semiconductors andis composed of two parts. The former part is about the morphology andproperties of cobalt oxides and the latter part is about aluminum nitride andcobalt composited films. For all the materials preparation, chemical vapordeposition method was used.In the first part of experiment, cobalt and cobalt oxides nano-crystalswere synthesized on silicon substrates from Co(NO3)26H2O powder via CVD.SEM, FE-SEM, and TEM showed different morphologies, such as continuousfilms, nano-bars, nano-dices, nano-flakes and nano-strings. For their structureand properties characterizations, XRD, Raman spectra, and VSM were used. It iscleared that depending on synthesized temperature, morphologies of the cobaltand cobalt oxides films changed significantly, and they demonstrated differentproperties.In the second part of experiment, AlN and cobalt were synthesized onsilicon substrates from Al and Co(NO3)26H2O powder via CVD. XRD, SEMand VSM showed that depending on the morphology, the magnetization and theamount of oxidized productions changed. Furthermore, the nanostructure of AlNnanowire distributed with cobalt particles was successfully observed by TEM.The observation results have demonstrated that the synthesized AlN and cobaltare completely separated in nanometer scale.
Keywords/Search Tags:Characteristics
PDF Full Text Request
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