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Preparation And Self-cleaning Antireflective Properties Of SiO2/TiO2Films

Posted on:2014-06-02Degree:MasterType:Thesis
Country:ChinaCandidate:H Q TangFull Text:PDF
GTID:2251330392463900Subject:Physical Electronics
Abstract/Summary:PDF Full Text Request
Important element part of solar energy utilization system is the Solar glass cover. WhenTitanium dioxide do a self-cleaning materials,Self-cleaning solar glass cover and lighttransmittance are two constraints parameters, To solve these two issues is a very important issue,It will be able to bring huge economic benefits.In this paper, First, The method was thattitanium dioxide, silica powder made in different proportions mixed target,The crystal structureof the target detected by using X-ray diffraction (XRD). Then the slide glass used as a substrate,The nano SiO2/TiO2composite films were made by magnetron sputtering. Method Two wasthat we optical designed the multi-layer film of SiO2/TiO2. Then the Ultra-white glass used as asubstrate, The SiO2/TiO2multilayer films were made by electron beam evaporation method.Prepared by two methods of sample were annealed at different temperature at atmosphere, andwe Studied the prepared thin-film’s structure, morphology and performance. SiO2/TiO2thinfilm surface morphology was investigated by atomic force microscopy (AFM); Differentpreparation parameters studied by using UV-visible spectrophotometer (UV-VIS) transmittanceof SiO2/TiO2films; we tested the SiO2/TiO2films prepared with different parameters on thehydrophilic performance and photocatalytic performance by using intravenous infusion ofcontact angle measurement. The results show that:(1) The SiO2/TiO2composite films thickness of48nm were made by magnetron sputteringmethod. At450℃annealing,the dense grain arranged to form a dense uniform film,TheSiO2/TiO2composite film transmittance is the largest, Transmission rate was t90.5%to meetthe solar cover glass requires a relatively high light transmittance requirements. When the targetTiO2content is5%the proceeds SiO2/TiO2composite films light transmission rate is the highest.4hours after irradiation with ultraviolet light, The SiO2/TiO2thin film of water contact anglewas changed to4-8°. Film coated with oleic acid ultraviolet irradiation after16hours, The typeTiO2content SiO2/TiO2film surface water contact angle was reduced to below10°(2) SiO2/TiO2multilayer films was made by Electron beam evaporation method, At450℃annealing, SiO2/TiO2film surface with an average particle diameter of180nm particles piled,The film surface roughness was4.46nm. It could clearly be seen after annealing the450℃ oxide, The sample surface morphology of a significant change occurred, Crystal grain sizeincreases and Surface roughness increases. At450℃annealing,Grain growth completely,Thedense grain arranged to form a dense uniform film, and had a relatively large specific surfacearea. The SiO2/TiO2multilayer film after450℃annealing transmittance to be higher than theunannealed. Transmission rate was to96.3%.It was conducive to improved transmittance. Wetested multilayer film of the SiO2/TiO2hydrophilic performance and analyzed photocatalyticproperties, Super-hydrophilic film had a very good performance and photocatalytic properties.
Keywords/Search Tags:Magnetron sputtering, Electron beam evaporation, SiO2/TiO2Composite Films, Self-cleaning, Transmittance
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