Preparation And Color Fastness Research Of Plated Color Fabric By Magnetron Sputtering

Traditional textile printing and dyeing industry in the dyeing process will cause serious pollution to the environment,the most important of which is water pollution.In order to solve this problem,some new dyeing methods have appeared.In this paper,We use magnetron sputtering method to prepare the colored fabric.The effect of process parameters on the surface morphology and film thickness of the fabric was studied,The color change of the fabric was analyzed.Cu films and CuO films with different target current were prepared.The surface of fabric was rich and colorful,and the color was characterized by spectrophotometer.The relationship between the target current and the K / S curve is analyzed.The effect of target current on the color fastness of fabric was studied.In addition,a finishing solution used to enhance the color fastness of the magnetron sputtering colored fabric was prepared.In this paper,the principle of magnetron sputtering is analyzed and discussed.It is found that the color of the fabric after magnetron sputtering is that the nanometer film.The nano-film on the surface of the fabric causes the light to interfere,diffract and scatter.This method of making the fabric color is a physical method,the production process will not cause pollution to the environment.Magnetron sputtering coated fabrics are affected by three main process parameters: sputtering power,working pressure and sputtering time.By analyzing the surface of the fabric under different sputtering power,working pressure and sputtering time,it is found that the optimum conditions of sputtering power are: 100 W ~ 120 W,the optimum condition of working pressure is 0.8Pa.At this time the fabric surface is smooth,good density.The thickness of the film on the surface of the fabric increases with the increase of the sputtering time,and the color gradually increases.In order to exploit more magnetron sputtering color fabric,Cu and CuO films were coated on polyester fabric under different target currents.The results show that the surface color of Cu film is: light gray ? gray ? light yellow;the surface color of CuO film is: yellow ? green ? blue ? purple ? red ? orange.The color of thefabric was characterized by spectrophotometer,and the relationship between the target current and the K/S curve of the fabric was studied.When the target current is gradually increased,the K/S curve of the Cu film plating fabric becomes higher and higher,and the peak of the K/S curve of the CuO film plating fabric gradually shifts to the left of the coordinate axis,and the peak value gradually increases.After comparison,it was found that the effect of CuO film color fabric was better than that of Cu film color fabric.Finally,the effects of different target currents on the magnetron sputtering silk and polyester fabric were analyzed.The results show that the color fastness of polyester fabric is higher than that of silk fabric.The fabric after magnetron sputtering has no staining effect on other fabrics.And in a certain range,the color fastness increases with the target current increases,at 6A to achieve the best.At this time the fabric color fastness: Ti film fabric> Ss film fabric> Cu film fabric.The experiment was also carried out with a mixed solution of 1% N2 + 1% P37 + 0.5% DSO and distilled water,through the finishing to the fabric surface,it was found that the solution had a significant effect on the color fastness of the magnetized sputtering plated color fabric.