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Pulsed current electrodeposition of tin and tin-copper films

Posted on:2006-04-29Degree:M.ScType:Thesis
University:University of Alberta (Canada)Candidate:Olsen, Kristian PeterFull Text:PDF
GTID:2451390005494507Subject:Engineering
Abstract/Summary:
This work considers electrodeposited Sn-Cu films for electronic packaging using an additive-free sulphate bath. A background of packaging techniques is given, and eutectic Sn-Cu is set within this context. The films were deposited onto Au- and Cu-coated Si wafers, and wrought Cu. Morphology, coverage and composition are surveyed under a variable set of direct- and pulsed-current parameters. It is determined that pulse duty and average current density have a marked effect on the films. Solderability trials produced well-covered films on wrought Cu substrates. Citric acid additions were studied for use as a bath stabilizer.
Keywords/Search Tags:Films
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