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Microstructure And Tribological Properties In Multiple Environments Of Nc-Cu/a-C:H Films

Posted on:2021-04-27Degree:MasterType:Thesis
Country:ChinaCandidate:J MengFull Text:PDF
GTID:2481306110494404Subject:Materials engineering
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As a kind of novel solid lubricant,amorphous hydrogenated carbon(a-C:H)film,with the characteristics of high hardness,low coefficient of friction,good wear and corrosion resistance and chemically inertness,etc.,is considered as a very promising anti-friction and wear-resistant material and expected to meet the application under a variety of extreme conditions.However,due to the high internal stress and different tribological properties in multiple environments,the practical application of a-C:H film was limited.Doping other elements in an a-C:H film can effectively reduce the internal stress,improve the toughness and tribological adaptability in multiple environments of the film.Copper(Cu),as a weak carbide forming metal,has good ductility and self-lubricating effect,and does not react with carbon in the film.Doping Cu in the a-C:H film may solve the defects of a-C:H film,such as large internal stress,large difference tribological properties in multi environment.In this article,the copper doping a-C:H(nc-Cu/a-C:H)composite films were deposited on single crystal silicon wafer and 304ASS substrate by a mixture gas of argon(Ar)and methane(CH4)bombarding the copper target using a pulsed magnetron sputtering technique.The doping content of copper was controlled by adjusting the CH4 flow ratio in the mixture gas.The microstructure and mechanical properties of the films under different CH4 ratios were investigated.The tribological properties in multiple environments and related mechanism of the films were studied.The main results are as follows:(1)nc-Cu/a-C:H films with a total thickness of 1.25?m and different Cu contents were prepared by adjusting the CH4 gas ratio.The thin films show a fine grain and compact structure.(2)XPS analysis indicated that as the proportion of CH4 in the mixed gas increased,the carbon content in the film increased and the Cu content decreased.When the CH4 ratio reached 65%,the Cu content in the film reduced to 3.35 at.%,and the peak area of sp3C-C decreased significantly,while the peak area of sp2C=C increased.(3)XRD analysis show that no carbon diffraction peak appearing in the films indicated that carbon was existed in the films with a amorphous form.As the proportion of CH4 increased,the content of Cu in the films gradually decreased,and the intensity of Cu diffraction peak gradually decreased.Cu diffraction peaks were not found in the film at a CH4 proportion of 65%.Cu mainly existed in a form of nanocrystalline in the films.So nanocrystals/amorphous structure composite films(nc-Cu/a-C:H)were formed.(4)The Raman spectroscopy analysis results showed that as the CH4proportion increased from 50%to 60%,the G peak position of the films moved slightly towards the higher wave number and ID/IG ratio decreased.The film under a CH4 proportion of 60%had the lowest ID/IGratio and the highest sp3C content.When the CH4 proportion reached to65%,the G peak position of the film increased significantly to high wave number and the ID/IG ratio reached a maximum value.It indicated that the content of sp2C increased significantly.(5)The indentation test indicated that the hardness and elastic modulus of nc-Cu/a-C:H films under CH4 ratio 50%and 55%were low.However,the films show a good toughness and the best film-substrate adhesion.The hardness of the film under a CH4 proportion of 60%and with the highest content of sp3C in the film was better than that under CH4 proportion of 50%and 55%.Although the toughness of the film was slightly poor,there was no continuous observable spalling when the film is under a Rockwell indentation,meaning the film with a better bonding strength.When the proportion of CH4 was 65%,the film with the lowest Cu content and highest hardness show a worse toughness and film-substrate adhesion.(6)All the nc-Cu/a-C:H films prepared under different CH4proportions did not fail in the different friction environments(air,3.5%Na Cl solution,SBF solution).The wear mechanism of nc-Cu/a-C:H film in air condition was mainly abrasive wear.The film under the CH4 proportion of 60%show the lowest friction(0.098)coefficient and the best wear resistance in air(wear rate is 1.77?10-6mm3·N-1·m-1).However,the nc-Cu/a-C:H film under high CH4 ratio(65%)show a better wear performance in a 3.5%Na Cl aqueous solution and an artificial simulated body fluid(SBF).The film had a strong adaptability to the friction environment.(7)The tribological properties of nc-Cu/a-C:H film under 65%CH4ratio in the 2-D material(Mo S2?Mo S2-C?Mo S2-V and Mo S2-Ag)solutions were further investigated.The friction coefficient of the nc-Cu/a-C:H film in in Mo S2-Ag solution was the lowest(0.042).It may be due to the soft metals Cu and Ag can form a self-lubricating metal-rich transfer film at the friction interface.Colloids formed in the solution with the debris generated by friction with the Al2O3 ball reduced the friction coefficient of the film.
Keywords/Search Tags:nc-Cu/a-C:H Films, Magnetron Sputtering, Cu Doping, Hardness, Multi-environmental Tribological Properties
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