Study Of The Deposition Of DLC Film By PECVD

In this paper, we deposited diamond-like carbon (DLC) films on the Si substrate using butane (C₄H₁₀) and argon (Ar) as source gases by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD).Through adjusting technical parameters such as radio frequency power, bias voltage, substrate temperature and the flow rate of the source gase, we obtained high quality DLC films. The effect of technical parameters on deposition rate, hardness and surface roughness of DLC films were researched.The microstructure of the films were studied with Raman spectroscopy and FTIR. The morphology of the films were studied with Atomic Force Microscope(AFM).The thin film was dense, smooth and structurally amorphous. The hardness and surface roughness of the films were measured by nano-indenter and Taylor profilometer. Finally the effect of technical parameters on the properties of DLC films were discussed with measure results.