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Research On DC Micro-electroforming Based On SU-8UV Lithography Process

Posted on:2014-06-05Degree:MasterType:Thesis
Country:ChinaCandidate:R H MaFull Text:PDF
GTID:2251330422951669Subject:Instrumentation engineering
Abstract/Summary:PDF Full Text Request
As an important basis of MEMS(Micro Electro-Mechanical Systems),micro-fabrication technology is developing rapidly in the21st century. LIGA (i.e.lithography, electroforming, and molding) and UV-LIGA techniques are two keymicro-fabrication technologies which call for high aspect ratio microstructures, andthe advantage of LIGA or UV-LIGA lies in preparing microstructures with highaspect ratio. The exposure light source of LIGA technology is synchronous X-raysource which costs a lot. However, the low-cost of ultraviolet light source inUV-LIGA makes UV-LIGA more suitable for commercial application.In this paper, UV-LIGA technology process was studied, and SU-8photoresistultraviolet lithography parameters was optimized. Moreover, two kinds of DCmicro-electroforming experimental platform was developed in order to investigate theeffect of DC micro-electroforming parameters on the micro-electroformingexperimental results, and to determine the optimum parameters. The main contents areas follows:1. Principles of SU-8photoresist UV lithography were discussed, andexperiments was designed accordingly. Through several comparative experiments, theeffects of different lithography parameters on experimental results was discussed andanalyzed. Accordingly, lithography parameters were optimized for ideal experimentalresults, and optimum parameters were obtained.2. Through preliminary analysis, a closed electroforming micro electroformingplatform was built, and then improved by experimental results. Open electroformingtank micro-electroforming platform was also designed and built.3. Based on relevant references, nickel sulfamate electroforming solution waschosen to be the experimental environment. By comparative experiments, DCmicro-electroforming parameters, including electroforming solution temperature,current density and pH value, were studied to determine the effects of parameters onelectroformed microstructure results, and optimum parameters were obtained undersuch platform.In this study, based on the discussions and optimization of photoresist SU-8UVlithography parameters, high aspect ratio microstructures with straight sidewalls wereobtained. By improving DC micro-electroforming platform and optimizingmicro-electroforming parameters, DC micro electroforming results showed cast layerwas bright, uniform, and flat.
Keywords/Search Tags:Micro-fabrication techniques, UV-LIGA, SU-8UV lithography process, micro electroforming platform, DC micro electroforming
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