High-speed, High-precision Micro/Nano-imprint Lithography Key Technology Research

Nano-imprint lithography is a kind of new micro/nano graphic reproductiontechnology, compared to the electron/ion beam lithography, UV lithography and othermicro/nano processing method, and has the advantages of simple operation, high limitresolution (<10nm), good repeatability, high production efficiency, lower cost ofequipment, so once put forward known as “one of the ten technology may change theworld”, and was included in the international semiconductor development blueprint.However, the current international imprinting-format of single seal nano-imprintlithography is the biggest support for20cm (8in) wafer, and is not only high cost, but alsocan not meet the requirements of large-format imprinting of micro/nano structure, whichmakes the application field of micro/nano imprint technology limited.The paper proposed after the research "micro-region seal" high-speed, high-precisionstep continuous imprinting driving mode, to achieve large-format(≥400mm×400mm)imprinting of micro/nano structure. That is "high-speed, high-precision micro/nano-imprintlithography key technology research" as the topic for the research work.The specific contents are as follows：⑴The paper first studies related technology research and development situation ofthe domestic and foreign, and on the basis of analysis and research has established themain content of the research and the basic idea to solve the problem.⑵According to the requirements of the system design, with the comparison ofscheme design of micro/nano-imprint lithography, and finally a high-speed, high-precisionstep continuous imprinting combined micro/nano-imprint lithography scheme based onpermanent magnet synchronous linear motor driven is established. ⑶The aiming at design scheme, combined with the mechanical and electrical drivesystem, and mathematical model of "high-speed, high-precision step continuous imprintingcombined micro/nano-imprint" system is established.⑷According to the design scheme and the mathematical model, and have performeddesign selection of the key structure: linear motor, linear guide, imprinting module,imprinting pressure control, imprinting temperature control, grating ruler etc. And designuser operation control software.⑸Using high-speed, high-precision micro/nano-imprint device, the positionaccuracy, the maximum stable speed and the maximum acceleration of driven platformwere measured and studied. At last through experimental study on micro-lens arrayimprinting accuracy, it is further confirmed that the technology in this research is theadvanced and feasible.The innovations of this paper are as follows：⑴This paper put forward a high-speed, high-precision step continuous imprintingcombined driving mode based on “micro-region seal”, which can achieve to large-formatmicro/nano fabrication.⑵Mathematical model of "high-speed, high-precision step continuous imprintingcombined micro/nano-imprint" system is constructed, which provides the theoretical basisfor realization of structure design and motion control of micro/nano imprint device.⑶A high precision pressure control technology of micro/nano-imprint lithography isdeveloped, which can be better to meet pressure stability and real time control of imprintmold.