Plasma Enhanced CVD Equipment R&D Project Planning And Controlling Research

The purpose of research PECVD equipment R&D project planning and controlling is to solve the issues happened when performing PECVD equipment R&D, such as lots of similar projects delayed, overspent a lot even in the middle of the project, even resulted in the projects had to be stopped and the other situations cannot predicted.The current Chinese companies are lack of semiconductor equipment R&D experiences, and also limited in technology, don’t have very detailed plans before the projects start and cannot effective control the projects, which caused them cannot reach a very expected results and even don’t want to do this kind of projects as they are worry about the profits from the projects. To solve this problem and make the project successfully completed, this paper researches a very detailed plan of PECVD equipment R&D project, and researches methods of strictly controlling schedule, expense and quality to this project by using project planning and controlling knowledge.This paper starts from clarifying the characteristics of PECVD equipment R&D project, and clearly understanding the detail goals of this project. Use qualitative analysis method and quantitative analysis method to research the planning and controlling of this whole project. With using the planning tools of Gantt chart and WBS to breakdown the tasks of the project, to distribute the power and responsibility of the project, to get a final schedule of this project and optimized by using PERT method. About project controlling, make a special effort to investigate schedule, expense and quality, put weight to every task and analyses project progress, control the schedule by studying deviation analysis table, defined quality goals and control the quality by analyzing all the elements which could impact the project quality one by one, Control the cost by analyzing EVM parameters calculation of the project expense.