Research On The Layout Of Double Row Equipment In Digital Workshop

After mechanization and electrification,a new round of industrial revolution is taking place all over the world.Intelligent and digital manufacturing technology is the key to this industrial revolution.Compared with the advanced level in the world,the automation and digitalization level of domestic manufacturing enterprises is still relatively low.Facing the increasing international competition and the rising labor cost of manufacturing industry,the current labor-intensive manufacturing mode has become increasingly unable to meet the market requirements for production efficiency,manufacturing cost,product quality and other links.Many enterprises pay more and more attention to the importance of digital vehicle construction.In the construction of digital workshop,AGV is used instead of manual driving forklift,and automatic manufacturing equipment is used instead of traditional manufacturing equipment.This production mode brings the change of equipment layout rules.How to better layout the equipment in the digital workshop is an urgent problem.Based on this,this paper takes the digital workshop as the research background,analyzes and discusses the establishment of the equipment layout optimization model,the solution method and the three-dimensional virtual simulation.The main contents of this paper are as follows:(1)The double row device layout problem not only needs to determine the arrangement(relative position)of devices,but also needs to determine the specific location(absolute position)of devices.It is a set of discrete combinatorial optimization problems and continuous optimization problems.In this paper,according to the characteristics of automatic equipment and manual manufacturing units arranged in the upper and lower rows separately in the digital workshop,the original dual row layout model is modified,the binary decision variables that determine the line number of the equipment and whether the two equipment are in the same row are eliminated,and a special dual row layout model is established.In this model,the original complex two row device layout problem is transformed into a simple continuous layout optimization problem.(2)When the number of equipment in the workshop reaches a certain amount,the optimization problem of workshop equipment layout is a NP hard problem,which is difficult to get a better solution by using branch and bound method,SLP and other accurate solutions.In this paper,based on the principle of biological immune system,the standard particle swarm optimization algorithm is improved to get immune particle swarm optimization algorithm.The improved particle swarm optimization algorithm introduces the mechanism of antibody affinity and concentration,which can effectively avoid the problem of local optimization,early convergence and poor particle diversity.When using immune particle swarm optimization to solve a special two line layout model,this paper encodes the antibody with real number,which has a good effect on solving the continuous layout optimization problem.(3)The immune particle swarm optimization algorithm is used to solve the layout optimization problem of the actual digital workshop-b workshop,and the results are compared with the standard particle swarm optimization algorithm and genetic algorithm.The results show that compared with the other two algorithms,the immune particle swarm optimization algorithm has better results in solving speed and material handling cost target value.Based on the layout of immune particle swarm optimization algorithm,a three-dimensional model of workshop is built by using virtual simulation technology,and the layout of workshop B is adjusted in detail to make it more practical and intuitive.