The Application Of Multi-arc Ion Plating Plasma Technology And Computer Control

The deposition principle and development of multi-arc ion plating technology are introduced in this paper. The industrial application of this deposition technology is also described.The structure of this ion plating equipment is recited. The effects of some parameters on the performances of films are studied for Cr as the target. Cr-N films are deposited in this equipment, the influences of deposition parameters on the structure and properties of the films are analyzed, such as the ratio of gas (N2 and Ar), arc current, and bias voltage.The results show that the hardness and the wear resistance property of the substrates are improved by depositing Cr-N films. XRD analyses indicate that with the increasing of the ratio of N2, the structures of the Cr-N films are changed from Cr to Cr2N, then Cr2N+ CrN, finally CrN. Cr+Cr2N phases aren't found in this experiment, it is possible to be related to the ratio of the gas.In the experiment, bias voltage (40-200V) has little effect on the hardness of Cr-N films, while arc current is the main parameter to control the hardness of Cr-N films. The higher the arc current is, the lower the hardness is. It is because that the main structures of the films change from CrN to Cr when arc current increase.Control system of the plating film equipments is still introduced in brief. With the development of computer technique, the automation technique and communication technology, the automation is widely used in industry. With the increase of the application of plating technique, it will be an inevitable trend that plating equipments is controlled by computer.