Study And Preparation Of Silver Nanowires Transparent Conductive Films And Curcuit Graphics

Silver nanowires(AgNWs)have been widely used in optoelectronic devices,chemical production catalysts,nanobiosensor,micro-nano robots and solar panels due to its unique performance.In this paper,two different processes were used for the preparation of Ag-based transparent conductive films.Firstly,we prepared the AgNWs,and then the Ag-based transparent conductive films would be formed by fixing them onto the surface of the substrate(glass or PET)by scrapping and hot pressing method.Secondly,we used electrospinning technology to spin Ag-containing seed crystal to the substrate(glass or PET)surface at first,and then nano-silver would grow on the spinning line surface through the chemical selective growth,Ag-based transparent conductive films would be formed in the end.Many researchers have found that it is very important to improve the transparent conductive films by increasing the length to diameter ratio of the AgNWs.In this paper,the AgNWs was prepared by ethylene glycol reduction method.Using Ag NO3 as the main agent,ethylene glycol(EG)as the reducing agent,PVP as the inducer and FeCl3·6H2O as the control agent at 120 ℃ temperature and Ar atmosphere,we successfully synthesized the AgNWs with a uniform length of 50 μm and a diameter of 60 nm.Then,the Ag-based transparent conductive films with resistance of 38 Ω/sq and transmittance of 86% was successfully prepared at a temperature of 100 ℃,a pressure of 50 kg and 30 min hot-pressing by coating method.During the preparation of Ag-based transparent conductive films by electrospinning,we put forward to use the polymer SAN to complex Ag+to form the seed for Ag growth,and then discussed the effects of the amount of SAN in the spinning solution on the photoelectron propertiesof the Ag-based transparent conductive films.At last,Ag-based transparent conductive films with the resistance 20 Ω/sq and the transmittance 85.5% was successfully prepared.The preparation of Ag-based curcuit graphics by UV-laser print is put forward in view of the shortcomings of the conventional techniques and inkjet printing techniques.Its implementation was based on the combination of preparation of Ag-based transparent conductive films by blade coating and the selectivity of UV-laser of photosensitive resin curing.Under the existing conditions,the curcuit graphics with a minimum line width of 0.25 mm and a resistance of 21×10-5 Ω·cm was prepared.It provides a process for preparing large-scale integrated circuits in the future.